摘要
Inthispaper,anovelinterferometricmethodwithawiderangeofsensitivities,calledholographyquasiprojectionmoire,isproposed.Itcombinesthefeaturesofthevariateddoubleprojectionmoiremethodandtheholographicinterfer-ometrymethod.Thistechniqueisusedtostudythefailuremodesofmicroelectronicpackagingmodules.
出版日期
1997年02月12日(中国期刊网平台首次上网日期,不代表论文的发表时间)