首页 > 《中国化学快报：英文版》 > 2014年9期 > Etching graphitic carbon nitride by acid for enhanced photocatalytic activity toward degradation of 4-nitrophenol

Etching graphitic carbon nitride by acid for enhanced photocatalytic activity toward degradation of 4-nitrophenol

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摘要 Graphitic碳氮化物(g-C3有向在可见轻照耀下面的4-nitrophenol的降级的高photocatalytic活动的N4)被蚀刻的HCl准备由氨中立化列在后面。准备样品的结构，形态学，表面区域，和photocatalytic性质被学习。在处理以后，g-C3N4从几测微计减少了到几百纳米，和g-C3N4从11.5 增加了；m2/g到115 ；m2/g。同时，g-C3N4显著地在可见的光下面向4-nitrophenol的降级在处理以后被改进照耀。小粒子g-C3N4是5.7次体积g-C3为水处理和环境补习为未来应用使它成为有希望的可见轻光催化剂的N4,。

DOI n495nwoqdy/1437859

作者 Si-Zhan Wu;Cai-Hong Chen;Wei-De Zhang

机构地区不详

出处《中国化学快报：英文版》 2014年9期

关键词光催化活性苯酚降解氮化物硝基石墨蚀刻

分类 [理学][化学]

出版日期 2014年09月19日（中国期刊网平台首次上网日期，不代表论文的发表时间）

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来源期刊

中国化学快报：英文版

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相关关键词

光催化活性苯酚降解氮化物硝基石墨蚀刻

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