Implant Compositional Disordering on InGaAs/InP MQW Structures

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摘要 SomenewresultsofimplantdisorderingonInPbasedMQWstructuresbyim-plantedcompositionaldisorderingarepresented.TheenergyshiftofPLpeakdependsonionspecies,iondose,annealingconditionsandtargettemperature,TheresultsindicatethatthenonactiveionssuchasF^+andNe^+arethebestcandiatesforIICD,theiondosewhichcausedbiggestblueshiftisaround1×10^14cm^-2forroomtemperatureimplantationand5×10^14cm^-2foranelevatedimplantedtemperatureof200℃andtheoptimumannealingconditionisapproximately750℃for30s.AESandTEMcharacterizationsuggeststhationbombardmentbynonelectricallyactiveionssuchasF^+,Ne^+inducedsameamountoflayerinterdiffusionwhichresultsinthebandgapblueshiftduetothecompositionalchanges.
机构地区 不详
出版日期 1996年01月11日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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