Ultrafast dynamical process of Ge irradiated by the femtosecond laser pulses-中国期刊网

摘要 TheultrafastdynamicprocessinsemiconductorGeirradiatedbythefemtosecondlaserpulsesisnumericallysimulatedonthebasisofvanDrielsystem.Itisfoundthatwiththeincreaseofdepth,thecarrierdensityandlatticetemperaturedecrease,whilethecarriertemperaturefirstincreasesandthendrops.ThelaserfluencehasagreatinfluenceontheultrafastdynamicalprocessinGe.Asthelaserfluenceremainsaconstantvalue,thoughtheoverallevolutionofthecarrierdensityandlatticetemperatureisalmostindependentofpulsedurationandlaserintensity,increasingthelaserintensitywillbemoreeffectivethanincreasingthepulsedurationinthegenerationofcarriers.IrradiatingtheGesamplebythefemtoseconddoublepulses,theultrafastdynamicalprocessofsemiconductorcanbeaffectedbythetemporalintervalbetweenthedoublepulses.

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Ultrafast dynamical process of Ge irradiated by the femtosecond laser pulses

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Ultrafast dynamical process of Ge irradiated by the femtosecond laser pulses

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