Dependence of Structure and Haemocompatibility of Amorphous Carbon Films on Substrate Bias Voltage

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摘要 Tetrahedralamorphoushydrogenatedcarbon(ta-C:H)filmsonSi(lO0)substrateswerepreparedbyusingamagnetic-field-filterplasmastreamdepositionsystem.Sampleswithdifferentratiosofsp^3-bondtosp^2-bondwereobtainedbychangingthebiasvoltageappliedtothesubstrates.Theellipsometricspectraofvariouscarbonfilmsinthephotonenergyrangeof1.9-5.4eVweremeasured.Therefractiveindexnandtherelativesp^3CratioofthesefilmswereobtainedbysimulatingtheirellipsometricspectrausingtheForouhi-BloomermodelandbyusingtheBruggemaneffectivemediumapproximation,respectively.Thehaemocompatibilityoftheseta-C:Hfilmswasanalysedbyobservationofplateletadhesionandmeasurementofkineticclottingtime.Theresultsshowthatthesp^3Cfractionisdependentonthesubstratebiasvoltage,andthehaemocompatibilityisdependentontheratioofsp^3-bondtosp^2-bond.Agoodhaemocompatibilitymaterialofta-C:Hfilmswithasuitablesp^3Cfractioncanbepreparedbychangingthesubstratebiasvoltage.
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出版日期 2004年11月21日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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