Formation of High-quality Advanced High-k Oxide Layers at Low Temperature by Excimer UV Lamp-assisted Photo-CVD and Sol-gel Processing

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摘要 Wehavesuccessfullydemonstratedthathighqualityandhighdielectricconstantlayerscanbefabricatedbylowtemperaturephoto-inducedor-assistedprocessing.Ta2O5andZrO2havebeendepositedatt<400℃bymeansofaUVphoto-CVDtechniqueandHfO2byphoto-assistedsol-gelprocessingwiththeaidofexcimerlamps.TheUVannealingofas-grownlayerswasfoundtosignificantlyimprovetheirelectricalproperties.Lowleakagecurrentdensitiesontheorderof10-8A/cm2at1MV/cmfordepositedultrathinTa2O5filmsandca.10-6A/cm2forthephoto-CVDZrO2layersandphoto-irradiatedsol-gelHfO2layershavebeenreadilyachieved.TheimprovementintheleakagepropertiesoftheselayersisattributedtotheUV-generatedactiveoxygenspeciesO(1D)whichstronglyoxidizeanysuboxidestoformmorestoichiometricoxidesonremovingcertaindefects,oxygenvacanciesandimpuritiespresentintheas-preparedlayers.Thephoto-CVDTa2O5filmsdepositedacross10.16-cmSiwafersexhibitahighthicknessuniformitywithavariationoflessthan±2.0%beingobtainedforultrathinca.10nmthickfilms.Thelamptechnologycaninprinciplebeextendedtolargerareawafers,providingapromisinglowtemperatureroutetothefabricationofarangeofhighqualitythinfilmsforfutureULSItechnology.
作者 YUJ.J.
机构地区 不详
出版日期 2004年04月14日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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