摘要
Inthispaperwepresentanextensionofthetopologyoptimizationmethodtoincludeuncertaintiesdur-ingthefabricationofmacro,microandnanostructures.Morespecifically,weconsiderdevicesthataremanufacturedusingprocesseswhichmayresultin(uniformly)toothin(eroded)ortoothick(dilated)structurescomparedtotheintendedtopology.ExamplesareMEMSdevicesmanufacturedusingetchingprocesses,nano-devicesmanufacturedusinge-beamlithographyorlasermicro-machiningandmacrostructuresmanufacturedusingmillingprocesses.Inthesuggestedrobusttopologyoptimizationapproach,under-andover-etchingismodelledbyimageprocessing-based'erode'and'dilate'operatorsandtheoptimizationproblemisfor-mulatedasaworstcasedesignproblem.Applicationsofthemethodtothedesignofmacrostructuresforminimumcomplianceandmicrocompliantmechanismsshowthatthemethodprovidesmanufacturingtolerantdesignswithlittledecreaseinperformance.Asapositivesideeffecttherobustdesignformulationalsoeliminatesthelongstandingprob-lemofone-nodeconnectedhingesincompliantmechanismdesignusingtopologyoptimization.
出版日期
2009年02月12日（中国期刊网平台首次上网日期，不代表论文的发表时间）
