简介：WereportthedepositionofNb2O5filmsonunheatedBK-7glasssubstratesusingremoteplasmasputteringsystem.Theremoteplasmageometryallowspseudoseparationofplasmaandtargetbiasparameters,whichofferscompletedepositionratecontrol.Usingappropriateoxygenflowrates,high-densityandlow-lossNb2O5filmsaredepositedwithratesupto0.49nm/s.Lowerdepositionrates(~0.026nm/s)canalsobeobtainedbyworkingatlowtargetcurrentandvoltageandatlowpressure.Nb2O5filmsdepositedatdifferentrateshavetherefractiveindexofabout2.3andtheextinctioncoefficientaslowas6.9×10-5.
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