简介：Themetalorganicvaporphaseepitaxy(MOVPE)growthofindiumgalliumnitride(InGaN)hasbeendiscussedindetailtowardsthefabricationofsolarcell.TheInGaNfilmwithIncontentsupto0.4aresuccessfullygrownbycontrollingthefundamentalgrowthparameterssuchastheprecursorgasflowrates,temperatureetc.TheformationofmetallicInoriginatesfromthehighervalue(0.74)oftrimethylindium/(trimethylindium+triethylgallium)(TMI/(TMI+TEG))molarratiowithlow(4100)V/Ⅲweightmolarratiowhilethelowervalue(0.2)ofTMI/(TMI+TEG)causesthephaseseparation.Itisalsonecessarytocontrolthegrowthrateandepitaxialfilmthicknesstosuppressthephaseseparationinthematerial.ThecrystallinequalityofgrownfilmsisstudiedanditisfoundtobemarkedlydeterioratedwithincreasingIncontent.ThelatticeparametersaswellasthethermalexpansioncoefficientmismatchbetweenGaNtemplateandInGaNepi-layerareprimarilyconsideredasthereasonstodeterioratethefilmqualityforhigherIncontent.ByusingIn0.16Ga0.84Nfilms,ann+-phomo-junctionstructureisfabricatedon0.65mmGaNtemplate.Forsuchadevice,theresponsetothelightillumination(AM1.5)isobservedwithanop-ncircuitvoltageof1.4Vandtheshortcircuitcurrentdensityof0.25mA/cm2.Toimprovetheperformanceaswellasincreasesolarphotoncapturing,thedeviceisfurtherfabricatedonthickGaNtemplatewithhigherIncontent.TheIn0.25Ga0.75Nn+-pjunctionsolarcellisfoundbetterperformancewithanop-ncircuitvoltageof1.5Vandtheshortcircuitcurrentdensityof0.5mA/cm2.ThisistheInGaNp-nhomo-junctionsolarcellwiththehighestIncontenteverreportedbyMOVPE.