简介：Theinfluenceofthehystereticbehaviourinreactivesputteringwithapurealuminiumtargetinthepresenceofargonandoxygenplasmaontransmittanceandsurfacefreeenergyofaluminiumoxidefilmswasinvestigatedbyplasmaopticalemissionspectroscopytechnology.Theevolutionsofaluminium,andaluminiumoxideemissionlinesasfunctionsofoxygenflowrateatconstantpowerandpressurewerestudied.Asteeptransitionfromthemetallicsputteringtothecompoundsputteringwasobserveduponincreasingtheoxygenflowratefrom0.0SCCMtoabove2.0SCCM.Thenanoptimaldepositionzonewasobtainedthroughanalyzingthehystereticcurvesofaluminiumandaluminiumoxideemissionlines.TheevolutionofcrystalstructuresofsampleswasdiscernedbyX-raydiffractionspectradata.EnergydispersiveX-rayspectroscopydataalsodemonstratetherelationshipbetweenthechemicalcompositionsofaluminiumoxidefilmsandthehystereticbehaviour.Thefilmdepositedbetween1.5SCCMand2.0SCCMoxygenflowratedisplaysanoptimalandstoichiometicatomicratioofOtoAlandmassratioofOtoAl.ThechangesinthetransmittanceofsampleswerediscoveredtodependontheoxygenflowratebyUV-VIStransmittancespectra,andthechangesinsurfacefreeenergywerestudiedbycontactanglemeasurement.