简介：介绍了单级衍射光栅的应用背景及其基本理论,分析了单级衍射光栅与传统黑白透射光栅的不同之处.阐述了单级衍射光栅的制作技术,分析了以电子束光刻、X射线光刻和微电镀技术为主的工艺路线的优缺点.综述了X光单级衍射光栅的发展历程以及存在的问题,并指出了其未来的研究方向.

简介：Themetalorganicvaporphaseepitaxy(MOVPE)growthofindiumgalliumnitride(InGaN)hasbeendiscussedindetailtowardsthefabricationofsolarcell.TheInGaNfilmwithIncontentsupto0.4aresuccessfullygrownbycontrollingthefundamentalgrowthparameterssuchastheprecursorgasflowrates,temperatureetc.TheformationofmetallicInoriginatesfromthehighervalue(0.74)oftrimethylindium/(trimethylindium+triethylgallium)(TMI/(TMI+TEG))molarratiowithlow(4100)V/Ⅲweightmolarratiowhilethelowervalue(0.2)ofTMI/(TMI+TEG)causesthephaseseparation.Itisalsonecessarytocontrolthegrowthrateandepitaxialfilmthicknesstosuppressthephaseseparationinthematerial.ThecrystallinequalityofgrownfilmsisstudiedanditisfoundtobemarkedlydeterioratedwithincreasingIncontent.ThelatticeparametersaswellasthethermalexpansioncoefficientmismatchbetweenGaNtemplateandInGaNepi-layerareprimarilyconsideredasthereasonstodeterioratethefilmqualityforhigherIncontent.ByusingIn0.16Ga0.84Nfilms,ann+-phomo-junctionstructureisfabricatedon0.65mmGaNtemplate.Forsuchadevice,theresponsetothelightillumination(AM1.5)isobservedwithanop-ncircuitvoltageof1.4Vandtheshortcircuitcurrentdensityof0.25mA/cm2.Toimprovetheperformanceaswellasincreasesolarphotoncapturing,thedeviceisfurtherfabricatedonthickGaNtemplatewithhigherIncontent.TheIn0.25Ga0.75Nn+-pjunctionsolarcellisfoundbetterperformancewithanop-ncircuitvoltageof1.5Vandtheshortcircuitcurrentdensityof0.5mA/cm2.ThisistheInGaNp-nhomo-junctionsolarcellwiththehighestIncontenteverreportedbyMOVPE.

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