简介:Theopticalparametersforthreesamplesofintrinsic,dopedSianddopedMg(AlxGa1-x)yIn1-yPpreparedbytheMOCVDonGaAssubstrateweremeasuredbyusingellipsometryandwerecalculatedbythetwo-layerabsorptionfilmmodel.Theresultsobtainedwerediscussed.Thegrownratesandthicknessofoxidiclayerontheintrinsic(AlxGa1-x)yIn1-yPsurfaceexposedintheatmospherewerestudied.Alineardependenceofoxidiclayerthicknessonthetimewasobtained.
简介:RamanscatteringspectroscopyisappliedtoinvestigatethephononmodesinGaxIn1-xP(x=0.52)and(AlxGa1-x)0.51In0.49P(x=0.29)alloys.Two-modebehaviorinGaxIn1-xPandthree-modebehaviorin(AlxGa1-x)0.51In0.49Pareobserved.InorderedGaxIn1-xP,weclearlydistinguishtheTO1(GaP-like)modeandthesplittingofLO1(GaP-like)andLO2(InP-like)modes,whichisbelievedtobetheresultofsuperlatticeeffectofordering,andtheLO1+LO2mode,whichisobservedforthefirsttime.Inadditiontotheb/aratio,it'sfoundthattherelativeintensityoftheFLAandtheLO1+LO2modesalsocorrespondstothedegreeoforder.TheTO1andthesplittingofLO1andLO2devotetogethertothereductionofthe'valleydepth'.In(AlxGa1-x)0.51In0.49P,thedoublingofFLAisobserved.DuetotheinfluenceofAlcomposition,theGaP-likeLOmodebecomesashoulderoftheInP-likeLOmode.TheunresolvedRamanspectraindicatetheexistenceoforderedstructurein(AlxGa1-x)0.51In0.49Palloys.
简介:UsingdoublecrystalX-raysdiffraction(DCXRD)andatomicforcemicroscopy(AFM),theresultsofGexSi1-xgrownUHV/CVDfromSi2H6andSiH4areanalyzedandcompared.Adsorbatescanmigratetotheenergy-favoringpositionduetotheslowgrowthratefromSiH4.Inthiscase,aSibufferthatisolatestheeffectofsubstrateonepilayercouldnotbegrown,whichresultsinapitpenetratingintoepilayerandbuffer.TheFWHMis0.055°inDCXRDfromSiH4.Thepresenceofdiffractionfringesisanindicationofanexcellentcrystallinequality,TheroughnessofthesurfaceisimprovedifgrownbySi2H6:however,thecrystalqualityoftheGex2Si1-xmaterialbecameworsethanthatfromSiH4duetomuchlargergrowthratefromSi2H6.ThecontentofGeisobtainedfromDCXRD,whichindicatesthegrowthratefromSi2H6islargest,thenGeH4andthatfromSiH4isleast.