Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon

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摘要 Thedual-frequencycapacitivelycoupledplasma(DF-CCP)withinductiveenhancementsystemisanewlydesignedplasmareactor.Differentfromtheconventionalinductivelycoupledplasma(ICP)reactors,nowaradiofrequency(rf)powerisconnectedtoanantennaplacedoutsidethechamberwithaone-turnbarecoilplacedbetweentwoelectrodesinDF-CCP.Thispapergivesadetaileddescriptionofitsstructure.Moreover,investigationsonsomecharacteristicsofdischargesinthisapparatusweremadeviaaLangmuirprobe.
机构地区 不详
出版日期 2013年10月20日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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