摘要
Thedual-frequencycapacitivelycoupledplasma(DF-CCP)withinductiveenhancementsystemisanewlydesignedplasmareactor.Differentfromtheconventionalinductivelycoupledplasma(ICP)reactors,nowaradiofrequency(rf)powerisconnectedtoanantennaplacedoutsidethechamberwithaone-turnbarecoilplacedbetweentwoelectrodesinDF-CCP.Thispapergivesadetaileddescriptionofitsstructure.Moreover,investigationsonsomecharacteristicsofdischargesinthisapparatusweremadeviaaLangmuirprobe.
出版日期
2013年10月20日(中国期刊网平台首次上网日期,不代表论文的发表时间)