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2018年4期
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Response of Silicon Nitride Ceramics under High-enthalpy Plasma Flows
Response of Silicon Nitride Ceramics under High-enthalpy Plasma Flows
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摘要
未填写
DOI
pd51p27mj7/1866171
作者
GUAN Jiasuo;CHENG Laifei;WANG Yaohui
机构地区
不详
出处
《武汉理工大学学报:材料科学英文版》
2018年4期
关键词
热流动
氮化物
陶艺
血浆
热含量
反应
分类
[一般工业技术][材料科学与工程]
出版日期
2018年04月14日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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Nonlinear optics on silicon-rich nitride--a high Nonlinear figure of merit CMOS platform [Invitedl
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ZHONGBo-qiang.
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来源期刊
武汉理工大学学报:材料科学英文版
2018年4期
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热流动
氮化物
陶艺
血浆
热含量
反应
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