Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition Method

(整期优先)网络出版时间:1998-01-11
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Amorphoussiliconfilmsarepreparedatlowertemperatureof350℃bynewcatalyticchemicalvapordepositionmethod.Inthemethod,materialgases(SiH4andH2)aredecomposedbycatalyticreactionatgiventemperature,soa-Sifilmsaredepositedonsubstrates.Itisfoundthata-Sifilmswithhighqualitycanbeobtain,suchashighphotosensitivityof10^6,lowspindensityof2.5×10^16cm^-3.