Adischarge-produced-plasma(DPP)sourceemittingintheextremeultraviolet(EUV)spectralregionisrunningattheENEAFrascatiResearchCentre.Theplasmaisgeneratedinlow-pressurexenongasandefficientlyemits100-nsdurationradiationpulsesinthe10–20-nmwavelengthrange,withanenergyof20mJ/shot/srata10-Hzrepetitionrate.Thecomplexdischargeevolutionisconstantlyexaminedandcontrolledwithelectricalmeasurements,whileansgatedCCDcameraallowedobservationofthedischargedevelopmentinthevisible,detectionoftime-resolvedplasmacolumnpinching,andoptimizationofthepre-ionizationtiming.AccuratelycalibratedZr-filteredPINdiodesareusedtomonitorthetemporalbehaviourandenergyemissionoftheEUVpulses,whilethecalibrationofadosimetricfilmallowsquantitativeimagingoftheemittedradiation.Thiscomprehensiveplasmadiagnosticshasdemonstrateditseffectivenessinsuitablyadjustingthesourceconfigurationforseveralapplications,suchasexposuresofphotonicmaterialsandinnovativephotoresists.
