简介:采用PECVD技术在1.55μnInGaAsP-InPMQW激光器结构的材料上沉积SiO2薄膜和含磷组分的SiO(P)电介质薄膜,经过快速热退火(RTA)后,样品的PL谱测试表明:覆盖有普通SiO2薄膜的样品蓝移量在5~74nm,而覆盖SiO(P)薄膜的样品呈现出341nm的大蓝移量.对SiO(P)薄膜的样品经红外光谱及XPS谱分析后证明,该膜的结构为SiOP,存在Si-O和P-O键,Si和P为正价键,其结合能分别为103.6eV和134.6eV.在退火过程中SiOP膜存在P原子的外扩散,它强烈地影响量子阱混合的效果,该SiOP膜明显区别于SiO2电介质薄膜.
简介:DistributedBraggreflectors(DBRs)areessentialcomponentsforthedevelopmentofoptoelectronicdevices.Inthispaper,wefirstreporttheuseofthenanoporousGaN(NP-GaN)DBRasatemplateforregrowthofInGaN-basedlight-emittingdiodes(LEDs).Thewafer-scaleNP-GaNDBR,whichisfabricatedbyelectrochemicaletchinginaneutralsolution,hasasmoothsurface,highreflectivity(>99.5%),andwidespectralstopbandwidth(>70nm).ThechemicalcompositionoftheregrownLEDthinfilmissimilartothatofthereferenceLED,butthephotoluminescence(PL)lifetime,PLintensity,andelectroluminescenceintensityoftheLEDwiththeDBRareenhancedseveraltimescomparedtothoseofthereferenceLED.TheintensityenhancementisattributedtothelightreflectioneffectoftheNP-GaNDBRandimprovedcrystallinequalityasaresultoftheetchingscheme,whereastheenhancementofPLlifetimeisattributabletothelatter.
简介:考虑光场限制因子、温度变化和阱间载流子非均匀分布,给出A1GaInAs多量子阱增益求解的分析模型。对量子阱应变量、阱宽和载流子浓度对材料增益TE模和TM模的影响进行了分析。设计出C波段内增益低偏振相关的混合应变多量子阱结构。在15~45℃温度范围,其模式增益具有低的偏振相关性(2%以内);当注入载流子浓度从2×10^24m^-3。增大到3×10^24m^-3时,模式增益逐渐增大,且能在一定温度下保持低的偏振相关(3%以内)。
简介:Monolithicwhite-light-emittingdiodes(whiteLEDs)withoutphosphorsaredemonstratedusingInGaN/GaNmultiplequantumwells(MQWs)grownonGaNmicroringsformedbyselectiveareaepitaxyonSiO2maskpatterns.Themicroringstructureiscomposedof{1-101}semi-polarfacetsanda(0001)c-plane,attributedtofavorablesurfacepolarityandsurfaceenergy.ThewhitelightisrealizedbycombiningshortandlongwavelengthsofelectroluminescenceemissionsfromInGaN/GaNMQWsonthe{1-101}semi-polarfacetsandthe(0001)c-plane,respectively.ThechangeintheemissionwavelengthsfromeachmicrofacetisduetotheIncompositionvariationsoftheMQWs.Theseresultssuggestthatwhiteemissioncanpossiblybeobtainedwithoutusingphosphorsbycombiningemissionlightfrommicrostructures.
简介:本文用光荧光(PL)方法研究了磷离子注入具有两个不同发射波长的InGaAsP/InP双量子阱结构引起的混合.注入能量为120keV,剂量范围为1×1011-1×1014/cm2.注入后,在高纯氮保护下,样品在700℃进行快速热退火30秒.实验结果表明,小剂量注入(~1011/cm2)能较好地诱导近表面阱的混合,且两个阱保持了不同发射波长,说明离子注入诱导量子阱混合与注入深度有关.大剂量注入(>1012/cm2)时,发射波长为1.59μm量子阱混合的程度(蓝移值大于130nm)超过了1.52μm量子阱混合的程度,且两个阱的PL发射峰基本上合并成一个单峰.
简介:将有机材料PBD和Alq3交替生长,制备PBD/Alq3有机多层量子阱结构(OMQWs)。利用电化学循环伏安法和光吸收分别测定PBD和Alq3最低空分子轨道(LUMO)和最高占据分子轨道(HOMO)。从能带图可看出,类似于无机半导体中的Ⅰ型量子阱结构。利用小角X射线衍射(XRD)和荧光光谱研究了OMQWs的结构特征和光致发光特性。本文基于四个周期制备了不同势垒层和势阱层厚度的样品。随着势垒层厚度地变化,PBD与Alq3之间的能量转移也有所变化,文中将给与讨论。
简介:ThinheavilyMg-dopedInGaNandGaNcompoundcontactlayerisusedtoformNi/AuOhmiccontacttop-GaN.ThegrowthconditionsofthecompoundcontactlayeranditseffectontheperformanceofNi/AuOhmiccontacttop-GaNareinvestigated.Itisconfirmedthatthespecificcontactresistivitycanbelowerednearlytwoordersbyoptimizingthegrowthconditionsofcompoundcontactlayer.WhentheflowrateratiobetweenMgandGagassourcesofp++-InGaNlayeris10.6%andthethicknessofp++-InGaNlayeris3nm,thelowestspecificcontactresistivityof3.98×10-5?·cm2isachieved.Inaddition,theexperimentalresultsindicatethatthespecificcontactresistivitycanbefurtherloweredto1.07×10-7?·cm2byoptimizingthealloyingannealingtemperatureto520℃.