简介:全氟化碳是温室气体,大量排放到大气中将会严重污染环境,在薄膜晶体管液晶显示器的生产过程中需要用全氟化碳做等离子刻蚀的反应性气体和在化学气相沉积工艺中做清洗气体,为减少使用过程中全氟化碳的对外排放,国外的TFT-LCD企业作了大量的工作,特别是日本、韩国、我国的台湾地区.文章介绍了全氟化碳温室效应的计算方法、全氟化碳在TFT-LCD制造过程中的具体应用、国外为减少全氟化碳排放采取的措施,相信这些经验对处于起步阶段的我国TFT-LCD行业有很好的借鉴作用.
简介:Usinganewlow-temperatureprocess(<600℃),thepoly-SiTFTwasfabricatedbymetal-inducedlateralcrystallization(MILC).Anultrathinaluminumlayerwasdepositedona-Sifilmandselectivelyformedbyphotolithography.Thefilmswerethenannealedat560℃toobtainlaterallycrystallizedpoly-Sifilm,whichisusedasthechannelareaofaTFT.Thepoly-SiTFTshowedanon/offcurrentratioofhigherthan1×106atadrainvoltageof5V.TheelectricalpropertiesaremuchbetterthanTFTfabricatedbyconventionalcrystallizationat600℃.
简介:ThepatternofITOtransparentelectrodeofpixelcellsinTFTAMLCDisacriticalstepinthemanufacturingprocessofflatpaneldisplaydevices,thedevelopmentofsuitableplasmareactiveionetchingisnecessarytoachievehighresolutiondisplay.InthisworkweinvestigatedtheAr/CF4plasmaetchingofITOasfunctionofdifferentparameters.WedemonstratedtheabilityofthisplasmatoetchITOandachievedanetchingrateofabout3.73nm/min,whichisexpectedtoincreaseforlongpumpingdownperiod,andalsothroughadditionofhydrogenintheplasma.FurthermorewedescribedtheITOetchingmechanisminAr/CF4plasma.Theinvestigationofselectivityshowedtobeverylowoversiliconnitrideandsilicondioxidebutveryhighoveraluminum.
简介:Usingcomputer-controlledliquidcrystaldisplay(LCD)asanimageprocessorandaCCDcameraasadetector,phase-onlycorrelationmeasurementisperformedwiththeaidofjointtransformcorrelationmethod(JTC).Thiscomputer-controlledLCD-CCDimageprocessingsystemmaybeapowerfultoolfordefectdetection,positioncontrolandpatternrecognition.Itenablesnewpossibilitiesinanalogreal-timeimageprocessing.Thisisofgreatinterestinmicroelectronicmanufacturingtodayandinthefuture.